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Materials and technologies (CT4)

Research program: Materials for Photovoltaics, Photonics and Microsystems Technology


Research of Materials for Photovoltaics, Photonics and Microsystems Technology

The research undertaken in the Department of Materials and Technologies, NTC, UWB is currently focused predominantly on research and development of materials for photovoltaic cells of second and third generations, on materials for photonics and on microsystems technology. Materials that have been subjects of the research are the following: thin layers of transparent conductive oxides (zinc oxide doped with Al, Sc and Ga elements in order to get the n-type conductivity and with nitrogen in order to get the p-type conductivity) and thin silicon films of various structural modifications (a-Si:H, mc-Si:H, pc-Si and Si nanostructures built in a dielectric matrix). All the materials listed are suitable for photovoltaics, photonics and microsystems technology and we are able to prepare them by ourselves in our laboratories in the form of thin films and multi-layered films spread over wafers and to analyse their physical properties for the most part (see the equipment listed below). In addition to the apparatuses for chemical deposition, which can only be used for depositing silane (SiH4) films, i.e. silicon-based materials, the Physical Vapour Deposition technique (PVD) can be used for creating various materials, for example, metals, semi-conductors, insulators, simple materials and compounds. Diagnostic methods, such as electron microscopy, X-ray diffraction, atomic and molecular spectroscopy, are very widely used.